JPH0322912Y2 - - Google Patents
Info
- Publication number
- JPH0322912Y2 JPH0322912Y2 JP6663086U JP6663086U JPH0322912Y2 JP H0322912 Y2 JPH0322912 Y2 JP H0322912Y2 JP 6663086 U JP6663086 U JP 6663086U JP 6663086 U JP6663086 U JP 6663086U JP H0322912 Y2 JPH0322912 Y2 JP H0322912Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- lid
- semiconductor manufacturing
- insulating film
- wafer holder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 239000004065 semiconductor Substances 0.000 claims description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 210000000078 claw Anatomy 0.000 description 3
- 230000002542 deteriorative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6663086U JPH0322912Y2 (en]) | 1986-04-30 | 1986-04-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6663086U JPH0322912Y2 (en]) | 1986-04-30 | 1986-04-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62178531U JPS62178531U (en]) | 1987-11-12 |
| JPH0322912Y2 true JPH0322912Y2 (en]) | 1991-05-20 |
Family
ID=30904815
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6663086U Expired JPH0322912Y2 (en]) | 1986-04-30 | 1986-04-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0322912Y2 (en]) |
-
1986
- 1986-04-30 JP JP6663086U patent/JPH0322912Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62178531U (en]) | 1987-11-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0645261A (ja) | 半導体気相成長装置 | |
| EP0471365B1 (en) | Semiconductor wafer processing apparatus | |
| JPH0878347A (ja) | エピタキシャル成長装置のサセプタ | |
| JPH02186622A (ja) | サセプタ | |
| JPH05166741A (ja) | 熱処理装置用基板支持具 | |
| JPH0322912Y2 (en]) | ||
| WO2006016764A1 (en) | Shower head of chemical vapor deposition apparatus | |
| JPS6053751B2 (ja) | プラズマ処理装置 | |
| JPH10150050A (ja) | 半導体装置製造用の加熱チャンバーの円形加熱板 | |
| US4348981A (en) | Vertical type vapor-phase growth apparatus | |
| JPH0227715A (ja) | 気相成長装置用加熱ステージ | |
| JPH0610140A (ja) | 薄膜堆積装置 | |
| JP3565469B2 (ja) | 気相成長用のサセプタ | |
| JPH1041251A (ja) | Ｃｖｄ装置およびｃｖｄ方法 | |
| JP2565156Y2 (ja) | 半導体製造装置及びそのウェーハ置台 | |
| JPS60263428A (ja) | 気相成長装置用サセプタ | |
| JPH06204179A (ja) | プラズマ処理方法 | |
| JPH02174114A (ja) | サセプタ | |
| US12068138B2 (en) | Semiconductor manufacturing apparatus and semiconductor device manufacturing method | |
| JPH07118465B2 (ja) | 縦型エピタキシャル装置用サセプター | |
| JPH02186623A (ja) | サセプタ | |
| JPH0513004Y2 (en]) | ||
| JPH02268429A (ja) | プラズマエッチング装置 | |
| JPH08139037A (ja) | 気相反応装置 | |
| JPH0982695A (ja) | 半導体製造装置および半導体装置の製造方法 |